Responsible

Altendorf, Simone
Simone Altendorf
Group leader

Phone: +49 351 4646-4205
Fax: +49 351 4646-4902
Chang, Chun-Fu
Chun-Fu Chang
Group leader

Phone: +49 351 4646-4323
Fax: +49 351 4646-4902
Tjeng, Liu Hao
Liu Hao Tjeng
Director

Phone: +49 351 4646-4900
Fax: +49 351 4646-4902
Room: B1.4.38

Members

Lee, Sang Hui
Sang Hui Lee
Undergraduate intern

Fax: +49 351 4646-4902
Liu, Cheng-En
Cheng-En Liu
Visiting graduate student

Phone: +49 351 4646-3532
Fax: +49 351 4646-4902
Pereira, Vanda
Vanda Pereira
Graduate student

Phone: +49 351 4646-4205
Fax: +49 351 4646-4902
Wu, Chi-Nan
Chi-Nan Wu
Post-doctoral research scientist

Phone: +49 351 4646-4205
Fax: +49 351 4646-4902

Epitaxial growth and characterization of oxide and topological insulator thin films

Epitaxial growth and characterization of oxide and topological insulator thin films

Transition metal and rare-earth oxides, which show metal-insulator transition and interesting magnetic properties are in the focus of our research. Single crystalline oxide thin films are prepared by Molecular Beam Epitaxy (MBE) technique. We are also interested in MBE-grown topological insulator compounds, materials having a full insulating gap in the bulk, but topologically protected conducting surface. Our state-of-art in-house UHV equipment allows for in-situ structural characterization by RHEED and LEED, in-situ spectroscopic characterization and determination of the bulk and surface electronic structure by XPS/ARPES, in-situ temperature dependent resistivity measurements.
Ultra-high-vacuum system for preparation and characterization of thin films Zoom Image
Ultra-high-vacuum system for preparation and characterization of thin films
 
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