Our second deposition system (Figure 1, sputter 2) hosts 13 magnetrons in total (4 x 3 inches; 9 x 2 inches) for DC and RF modes. As shown in Figure 2, the layout combined with an off-centred sample rotation allows us to use 10 of these magnetrons in planar geometry with a minimum substrate-to-target distance of 70 mm. Six of the 2-inch magnetrons can be tilted towards the larger 3-inch sources to form three independent clusters (Figure 2, clusters 1--3) of four guns each in confocal geometry. Therefore, simple buffer and capping layers can be deposited with a low distance in planar geometry and from the same target as used for composite films in confocal geometry. The reachable base pressure is <2 x 10-10mbar. Similar to the system presented above, samples can be heated to 1000°C during the deposition process. A linear shutter can cover parts of the sample or be driven slowly to form wedges.