The focus of our research are materials in thin film form, especially transition metal and rare-earth oxides as well as topological insulator compounds. Our state-of-art in-house ultra-high vacuum system consists of two molecular beam epitaxy chambers and five facilities for an in-situ characterization of the samples, including electron diffraction techniques (RHEED, LEED), photoelectron spectroscopy (XPS, ARPES), temperature-dependent resistivity measurements, and ionic liquid gating experiments.